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Lamp Annealing System for Speedy Thermal Processing RLA-1200

The lamp annealing system for 4-inch to 8-inch wafers achieves high-quality processing even for use in R&D. Activation and oxidation are available in a vacuum (LP) environment and N2 load-lock atmosphere.
Lamp Annealing System for Speedy Thermal Processing RLA-1200

Feature

  • 4 to 8 inch wafer size is available
  • Low cost system by manual susceptor transfer
  • Upper & lower cross lamp structure and soaking furnace improved the uniformity of in-plane temperature
  • Vacuum designed quartz tube enables accurate gas substitution and process at vacuum pressure
  • Equipped with operator friendly high performance control system

The lamp annealing system for the R&D of 4-inch to 8-inch wafers saves processing cost thanks to high-speed heating at 200°C/sec. and manual susceptor transfer. The structure using the upper and lower cross halogen lamps achieves superior in-plane temperature uniformity, making both of low cost and high-quality processing reality. Thanks to the quartz tube designed to be provided with a vacuum resistant property, processing is available in a clean vacuum (LP) environment and N2 load lock atmosphere.

Outer dimension (mm) 1300(W)×1300(D)×1850(H)
Operation temperature 400~1200°C
Heat up rate Max.200°C/sec
Lamp layout Upper & lower cross lamp arrays
Number of control zone 6
Wafer size 4~8 inch
Wafer transfer manual
Controller Model RSC1000
Options Vacuum system, Clean bench
Applications Annealing, Oxidation
Manufactured article 4~8 inch wafer