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Vertical Furnace for a small of production and R&D VF-1000

The small production type vertical furnace for experiments and researches (R&D) achieves high-quality processing.
The furnace is compact and requires only a small installation area but usable for a wide range of wafer diameter and exhibits the same temperature characteristics as those of mass-production furnaces.
Vertical Furnace for a small of production and R&D VF-1000

Feature

  • High performance processing for R&D
  • Mini Batch, max 25 wafers batch processing
  • 2 to 8 inch and 300mm wafer size are available
  • Equipped with LGO heater to realize high temperature performance as mass-production equipment
  • Equipped with limited function simple control system

The vertical furnace for experiments, researches (R&D) and small production can be used for a wide range of wafer sizes from 2- to 8-inch and up to 300 mm, and the size of mini batch can also be chosen from up to 25 wafers. Since the heater can be chosen from LGO heater and various other heaters, process development is available with the same furnace opening structure and heater performance as those of mass-production furnaces. The furnace can be used for various silicon wafer treatments (LPCVD, oxidation and diffusion), silicon gate oxynitriding and activation annealing for power device (Si and SiC) development, and other wide range of processes.

Outer dimension (mm) 1500(W)×1000(D)×2100(H)
Heater LGO heater
Flat zone length (mm) 160~250
Wafer size ~8 inch
Batch size 25 wafers
Controller Model 880
Option Forced-cooling system, N2 load lock, 25~150 wafers of processing (VF-2000), for 300mm Wafer
Applications Oxidation(Wet oxidation, Dry oxidation), Diffusion(Pocl3 diffusion, BBr3 diffusion), Annealing
Associated item POCl3, BBr3
Manufactured article Silicon wafer, Silicon Carbide material (Power Devices)