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Vertical Furnace for 8inch Wafer VF-5300

The vertical furnace with a built-in stocker processes 8-inch wafers at ultra high temperatures in large batches.
The furnace is a semiconductor heat treatment system that can perform oxidation, diffusion, LPCVD, activation annealing and various other heat treatments.
Vertical Furnace for 8inch Wafer VF-5300


  • Large batch, Max 150 wafers batch processing
  • Max 20 cassette stocks
  • Excellent temperature control from low to medium high temperature range by use of LGO heater
  • High-speed wafer transfer by use of single/five wafers handling robot
  • Equipped with operator friendly high performance control system

This model is a continuous large-batch, mass-production type vertical diffusion furnace equipped with a stocker for a maximum of 150 8-inch wafers or 20 cassettes. Thanks to the LGO heater, the furnace exhibits superior temperature characteristics over the range from low temperatures to ultra high temperatures. The furnace can be used for a wide range of processing from low-temperature annealing, nitride (Si3N4), polysilicon (poly Si) and other material LPCVD to oxidation and diffusion. A molybdenum disilicide (MoSi2) heater can also be used to support SiC power device gate oxynitriding and other ultra high temperature processing.

Outer dimension (mm) 900(W)×2300(D)×3250(H)
Heater LGO heater (ID Φ400mm)
Flat zone length (mm) 960
Wafer size 8 inch
Batch size 150 wafers
I/O port 2
Number of FOUP stock 20 (standard)
Finger 5 wafers+single wafer
Controller Model VSC1000
Option Forced-cooling system, N2 load lock, HOST communication (HSMS/GEM), Thin wafer (100µm or more)handling, SMIF operation
Applications Oxidation, Diffusion, CVD, Activated annealing
Processing object SiN, Si3N4
Manufactured article Silicon wafer, Thin wafer (Power Devices)