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Semiconductor

Semiconductor

Vertical Furnace for 300mm Wafer VF-5900 Vertical Furnace for 300mm Wafer VF-5900 The furnace is a heat treatment system for silicon wafer, IGBT, polyimide and thin wafer oxidation, diffusion and CVD. As our flagship model, the furnace is equipped with a large-capacity stocker and accomplishes short cycle time.
Vertical Furnace for 300mm Wafer VF-5700 Vertical Furnace for 300mm Wafer VF-5700 The heat treatment system performs silicon wafer, IGBT, polyimide and thin wafer oxidation, diffusion and CVD. Since the height is less than 3000 mm, this model can be easily introduced and accomplish short cycle time and high throughput.
Vertical Furnace for 8inch Wafer VF-5300 Vertical Furnace for 8inch Wafer VF-5300 The vertical furnace with a built-in stocker processes 8-inch wafers at ultra high temperatures in large batches. The furnace is a semiconductor heat treatment system that can perform oxidation, diffusion, LPCVD, activation annealing and various other heat treatments.
Mass-Production Model Flexible Vertical Furnace VF-5100 Mass-Production Model Flexible Vertical Furnace VF-5100 The large-batch, diffusion, LPCVD, vertical furnace performs 4- to 8-inch wafer ultra high-temperature treatment. The system can be flexibly configured to meet your production line to process a variety of products. The furnace is best for power device manufacture.
Low-Cost Mini Batch Vertical Furnace VF-3000 Low-Cost Mini Batch Vertical Furnace VF-3000 The low-price vertical furnace equipped with an auto conveyor can be used for the range from R&D to mass-production of 4- to 8-inch wafers. We have achieved such a low price that after-process users can introduce the furnace. Ultra high-temperature treatment is available and best suited for power device manufacture.
Vertical Furnace for a small of production and R&D VF-1000 Vertical Furnace for a small of production and R&D VF-1000 The small production type vertical furnace for experiments and researches (R&D) achieves high-quality processing. The furnace is compact and requires only a small installation area but usable for a wide range of wafer diameter and exhibits the same temperature characteristics as those of mass-production furnaces.
Mass-Production Model / Experimental Horizontal Furnace Model 200 series Mass-Production Model / Experimental Horizontal Furnace Model 200 series From small experiments and researches (R&D) to mass-production, the furnaces can be designed to meet users' needs. The horizontal furnaces can be used for solar battery and photovoltaic power system (PV) production as well as silicon wafers.
Lamp Annealing System for Speedy Thermal Processing RLA-3100 Lamp Annealing System for Speedy Thermal Processing RLA-3100 The system for 4- to 8-inch wafers performs activation and oxidation in a vacuum (LP) environment and N2 load-lock atmosphere. The upper and lower cross lamps (halogen) and a soaking system are used, for higher in-plane temperature distribution uniformity.
Lamp Annealing System for Speedy Thermal Processing RLA-1200 Lamp Annealing System for Speedy Thermal Processing RLA-1200 The lamp annealing system for 4-inch to 8-inch wafers achieves high-quality processing even for use in R&D. Activation and oxidation are available in a vacuum (LP) environment and N2 load-lock atmosphere.
Heated-air Circulating Type Clean Oven for 300mm Wafer SO2-12-F Heated-air Circulating Type Clean Oven for 300mm Wafer SO2-12-F The clean oven processes 300 mm (12-inch) wafers for semiconductor production. With FOUPs, 50 wafers/chamber can be fully automatically processed. Use the system for low-temperature processing of polyimide and other materials.

Laboratory Electric Furnace & Oven

Tube Furnace KTF 1100 deg C Series (1 Zone Control) Tube Furnace KTF 1100 deg C Series (1 Zone Control) Electrical furnaces (tube furnaces) for experiments and laboratory researches Horizontal, desktop, energy-saving furnaces can perform heat treatments in atmospheres using furnace tubes.
Tube Furnace KTF 1100 deg C Series (3 Zone Control) Tube Furnace KTF 1100 deg C Series (3 Zone Control) 3-zone controlling high-accuracy electrical furnaces for experiments and laboratory researches
Tube Furnace KTF 1200 deg C Series (3 Zone Control) Tube Furnace KTF 1200 deg C Series (3 Zone Control) 3-zone controlling, high-accuracy type electrical furnaces (tube furnaces) for experiments and laboratory researches Higher-grade type equipped with overheating preventing meters in all zones and half-divided type Moldatherm heaters.
Tube Furnace KTF 1500 deg C Series (1 Zone Control) Tube Furnace KTF 1500 deg C Series (1 Zone Control) Electrical furnaces (tube furnaces) using SiC heaters for experiments and laboratory researches Horizontal, desktop, energy-saving type Furnace tubes can be additionally installed for heat treatments in atmospheres.
Tube Furnace KTF 1700 deg C Series (1 Zone Control) Tube Furnace KTF 1700 deg C Series (1 Zone Control) Electrical furnaces using MoSiO2 heaters for experiments and laboratory researches
Clean Oven CLO Series Clean Oven CLO Series Class 100 air cleanliness is achieved by higher airtightness enabled by entirely sealing the inner chamber. Heat treatments in a N2 atmosphere are also available. The hot-air circulation system improves curing and annealing yields.
High-Temperature Clean Oven CLH Series High-Temperature Clean Oven CLH Series High-temperature baking in a clean environment enabled by the heat resistant high-performance filter and unique cooling unit. A hot-air circulation system is used to highly accurately carry out wafer and glass substrate baking/aging, polyimide curing and annealing.
Exhaust Gas Burn-out System GM Series Exhaust Gas Burn-out System GM Series Organic matters in the exhaust gas from ceramics temporary sintering and electronic part defatting are completely burnt. Exhaust gas thermal cracking is available at a maximum of 850 deg C.