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Semiconductor

Large caliber Vertical Furnace VFS-4000 Large caliber Vertical Furnace VFS-4000 The large-bore vertical furnace for 4.5G/5.5G has been developed by making use of semiconductor manufacturing equipment technologies for glass board manufacture. The furnace is suitable for low-compaction organic EL (OLED/AMOLED) frit sealing processes and dewatering.

Advanced Technology Industry

Clean Oven, Single Substrate Transfer Type CCBS series Clean Oven, Single Substrate Transfer Type CCBS series Our best-selling clean ovens for LCDs and OLEDs! Zero-damage to substrates, Treatment of sublimates during color filter resist post baking.
IR Furnace, Single Substrate Transfer Type CCBS-IR series IR Furnace, Single Substrate Transfer Type CCBS-IR series IR-heating type, single substrate transfer clean ovens, CCBS-IR series. For various baking treatment of IGZO, the next generation display TFT, and other LCDs and OLEDs.
Vacuum Dryer CCBS-V spec Vacuum Dryer CCBS-V spec Capable of vacuum dehydration baking and annealing of the LCD and OLED substrates of up to 10th generation. Supports various configurations, such as in-line with a preceding and succeeding process and using robots.
Roller Hearth Continuous Furnace RH series Roller Hearth Continuous Furnace RH series Transfers large glass substrates cleanly and continuously for heat treatment using special ceramic rollers. Also capable of sealing OLED frit glass.
Clean Batch System CBS series Clean Batch System CBS series Batch clean ovens suitable for the LTPS treatment. Standard model satisfying both specification and cost. Also capable of atmosphere treatment.
Walking Beam Type Continuous Clean Oven WB series Walking Beam Type Continuous Clean Oven WB series Walking beam method with low dust generation is used! High efficiency is achieved through the batch transfer of heat-resistant cassettes.
Resin belt Continuos Furnace RB series Resin belt Continuos Furnace RB series Flexible Solar Panel, Protection Film, For heat treatment of Film

Conveyor Furnace for Electronics Industry

Standard Muffle Furnace Standard Muffle Furnace Mesh-belt type continuous furnace using a muffle with excellent in-furnace atmosphere stability and reproducibility. Suitable for brazing, soldering, thick film baking, electrode drying, and de-binding.
Multi-Inlet/Exhaust Furnace for Nitrogen Atomosphers Multi-Inlet/Exhaust Furnace for Nitrogen Atomosphers Mesh-belt type continuous furnace enabling high precision N2 atmosphere separation using the latest gas control technology. Suitable for LTCC substrate and MLCC manufacturing, de-binding, and powder metallurgy baking.
Muffle-less Furnace Muffle-less Furnace Muffle-less furnace (atmosphere furnace) with suppressed heat dissipation and enhanced energy-saving effect. Suitable for LTCC substrate and inductor manufacturing, thick film baking, and glass sealing.
Ceramic Conveyor Type Continuous Furnace Ceramic Conveyor Type Continuous Furnace Special ceramic chains, excellent in heat resistance and abrasion resistance, are used as a transfer conveyor. Muffle-less, Ceramic semi-muffle, and Metal muffle types are selectable.
Compact Conveyor Furnace 810A Compact Conveyor Furnace 810A Small size with a reduced installation area, and capable of heat treatment in various atmospheres. Small conveyor furnace suitable for thick film baking, electrode drying, and ceramic substrate manufacturing experimentation.
In-line Type Vacuum Reflow Soldering Furnace In-line Type Vacuum Reflow Soldering Furnace Rapid and uniform heating is actualized by Halogen lamps. Nitrogen Atomosphers.
Clean Oven (Order Products) Clean Oven (Order Products) Continuous ovens originally manufactured using technologies for FPD manufacturing and clean oven for experimentation. For electronic parts, disks, glass epoxy substrates, film drying, curing, and annealing.

Laboratory Electric Furnace & Oven

Inert Gas Oven INL Series Inert Gas Oven INL Series Hot-air circulation type ovens performing heat treatments in the environments using N2 atmospheres at 20 ppm or lower O2 concentrations. They achieve ceramic part debinding (defatting), annealing and other effective heat treatments.
Inert Gas Oven INH Series Inert Gas Oven INH Series The ovens perform heat treatments at up to as high as 600 des C in a N2 atmosphere, achieving 20 ppm of low O2 concentration. The ovens are the type for production and have been used for abundant ceramic part defatting and various other non-oxidation heat treatments.
Compact-type Inert Gas Oven KLO-30NH Compact-type Inert Gas Oven KLO-30NH Compact N2 atmosphere oven optimal for researches and development Debinding, defatting, annealing and other heat treatments at lower than 300 ppm of O2 concentrations
Clean Oven CLO Series Clean Oven CLO Series Class 100 air cleanliness is achieved by higher airtightness enabled by entirely sealing the inner chamber. Heat treatments in a N2 atmosphere are also available. The hot-air circulation system improves curing and annealing yields.
High-Temperature Clean Oven CLH Series High-Temperature Clean Oven CLH Series High-temperature baking in a clean environment enabled by the heat resistant high-performance filter and unique cooling unit. A hot-air circulation system is used to highly accurately carry out wafer and glass substrate baking/aging, polyimide curing and annealing.
Exhaust Gas Burn-out System GM Series Exhaust Gas Burn-out System GM Series Organic matters in the exhaust gas from ceramics temporary sintering and electronic part defatting are completely burnt. Exhaust gas thermal cracking is available at a maximum of 850 deg C.