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Large batch, Max 100 wafers batch processing
Mini Batch, flexible 25 to 50 wafers batch processing
High-speed wafer transfer by use of single/five wafers handling robot
Flexible equipment configuration available for various production line
Mini batch, 50 to 75 wafers processing is available for R&D to mass production line
High performance processing for R&D
Proposing equipment configuration according to the customer’s needs based on usage, space, and budget
Low cost performance by limited function
Upper & lower cross lamp structure and heat uniformize unit improved the uniformity of in-plane
High performance process R&D
First heating up and cooling down, reduced power by KTS' exclusive LGO heater
Available for vacuum/atmospheric pressure process
